“Laser Crystallization for Polycrystalline Silicon Device
Applications”,
Technology and Applications of Amorphous Silicon
Springer-Verlag, 1999. ISBN: 3540657142
Jim Boyce and Ping Mei
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“Control of Layer Intermixing by Impurities and Defects”
Semiconductor Quantum Well Intermixing, Herbert Li (Editor)
Gordon & Breach Publishing Group, 2000. ISBN: 9056996894
Decai Sun and Ping Mei
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“Electronics Produced by Roll-to-roll Self-Aligned
Imprint Lithography”
LEOS Summer Topical Meetings, 2007 Digest of the IEEE Volume , Issue , 23-25
July 2007 Page(s):125 - 126
Digital Object Identifier 10.1109/LEOSST.2007.4288364
Jackson, W.B.; Perlov, C.; Amanza-Workman, M.; Braymen, S.; Chaiken, A.;
Jeffrey, F.; Hauschildt, J.;
Jeans, A.; Kwon, O.; Luo, H.; Mei, P.; Taussig, C.
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“Amorphous silicon memory arrays”
Journal of Non-Crystalline Solids Volume 352, Issues 9-20, 15 June 2006, Pages
859-862
W.B. Jackson, R. Elder, W. Hamburgen, A. Jeans, H.-J. Kim, H. Luo, P. Mei, C.
Perlov, C. Taussig,
H. Branz, P. Stradin, Q. Wang, S. Ward, S. Braymen and F. Jeffery
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“Low Temperature Thin-Film Silicon Diodes for
Consumer Electronics”
Collins, R.W., et al., eds. Amorphous and Nanocrystalline Silicon Science and
Technology 2005:
Proceedings of the Materials Research Society Symposium, 28 March–1 April 2005,
San Francisco, California. Materials Research Society Symposium Proceedings,
Vol. 862.
Warrendale, PA: Materials Research Society, 2005; pp. 709-714.
Wang, Q.; Ward, S.; Duda, A.; Hu, J.; Stradins, P.; Crandall, R.S.; Branz, H.M.;
Jeffrey, F.; Lou, H.;
Perlov, C.; Jackson, W.; Mei, P.; Taussig, C.
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“High-current-density thin-film silicon diodes grown
at low temperature”
Appl. Phys. Lett. 85, 2122 (2004); DOI:10.1063/1.1789580
Qi Wang, Scott Ward, Anna Duda, Jian Hu, Paul Stradins, Richard S. Crandall, and
Howard M. Branz
Craig Perlov, Warren Jackson, Ping Mei, and Carl Taussig
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“Economic In-Process Functional Testing Method for TFT
Arrays”
Xerox Disclosure Journal, U. S. Cl. 324, Int. Cl. G01R 031/22, Jan. 1999.
Ping Mei, Richard L. Weisfield, and Donald L. Smith |
“Laser processing for amorphous Si air-gap TFTs”
Thin Film Transistor Technologies V, Electrochemical Society 198th
Meeting Proceedings, 2000.
Mei, P.; Ho, J.; Wang, Y.; Lau, R.; Street, R.; Boyce, J. B.; Lu, J. P
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“Laser processing of amorphous silicon for large-area
polysilicon imagers”
Thin Solid Films vol.383, no.1-2 : 137-42, 15 Feb. 2001.
Boyce, J.B.; Fulks, R.T.; Ho, J.; Lau, R.; Lu, J.P.; Mei, P.; Street, R.A.; Van
Schuylenbergh, K.F.; Wang, Y.
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“Pulsed laser crystallization and doping
for thin film transistors” (Invited Paper)
Journal of Non-Crystalline Solids, Amorphous and Microcrystalline
Semiconductors -
Science and Technology (ICAMS-18); 1999 August 23-27; Snowbird, Utah. 266-269:
1252-1259, 2000.
Mei, P.; Boyce, J. B.; Lu, J. P.; Ho, J.; Fulks, R. T.
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“Laser processing of amorphous silicon for
polysilicon devices, circuits and flat-panel imagers”
Amorphous and Heterogeneous Silicon Thin Films - 2000. Materials Research
Society Symposium
Proceedings Vol.609) : A31.4.1-A31.4.12, 2001
Boyce, J.B.; Fulks, R.T.; Ho, J.; Lu, J.P.; Mei, P.; Street, R.A.; Van
Schuylenbergh, K.F.; Wang, Y.
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“The impact of self aligned amorphous Si thin film
transistors on imager array applications”
Journal of Non-Crystalline Solids; International Conference on Amorphous and
Microcrystalline Semiconductors
(ICAMS-18); 1999 August 23-27; Snowbird, Utah, 266-269: 1294-1298, 2000.
Lu, J. P.; Mei, P.; Rahn, J.; Ho, J; Wang, Y.; Boyce, J. B.; Street, R. A.
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“Polycrystalline nitride semiconductor light-emitting
diodes fabricated on quartz substrates”
Applied Physics Letters. 2000; 76 (16): 2182-2184. Bour, D. P.; Nickel,
N. M.; Van De Walle, C. G.; Kneissl, M.; Krusor, B. S.; Mei, P.; Johnson, N. M.
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"High-resolution, high fill factor a-Si:H sensor arrays
for optical imaging", IEEE Trans. Nucl. Sci. (USA), IEEE Transactions on
Nuclear Science, vol.46, no.3, pt.2, p. 457-61, 1999. Rahn, J.T.; Lemmi, F.; Lu,
J.P.; Mei, P.; Apte, R.B.; Street, R.A.; Lujan, R.; Weisfield, R.L.; Heanue, J.A.
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“Optical filter for fabricating self-aligned amorphous Si
TFTs”. Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to
Devices - 1999. Symposium. (Materials Research Society Symposium Proceedings
Vol.557) : 677-82, 1999. Mei, P.; Lu, J.P.; Chua, C.;
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“Application of self-aligned amorphous Si thin-film
transistors to driver circuits for flat panel displays and imagers”.
Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999.
Symposium. (Materials Research Society Symposium Proceedings Vol.557) : 647-52,
1999. Lu, J.P.; Mei, P.; Chua, C.;
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“High performance amorphous silicon image sensor arrays”,
J. Non-Cryst. Solids (Netherlands), Journal of Non-Crystalline Solids,
vol.227-230, pt.B, p. 1306-10, 0022-3093 Elsevier May 1998. Street, R.A.; Apte,
R.B.; Granberg, T.; Mei, P.; Ready, S.E.; Shah, K.S.; Weisfield, R.L.
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“Hybrid amorphous and polycrystalline silicon devices for
large-area electronics” (Invited Paper), Flat-Panel Display Materials -
1998. Symposium, p. 3-12. Mei, P.; Boyce, J.B.; Fork, D.K.; Anderson, G.; Ho,
J.; Lu, J.; Hack, M.; Lujan, R.
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“Performance study of self-aligned amorphous silicon
thin-film transistor circuits”, Proceedings of the Fourth Symposium on
Thin Film Transistor Technologies, p. 392-9. 1998. Lu, J.P.; Mei, P.; Lujan, R.;
Boyce, J.B.
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“Ubiquitous blue LEDs: the integration of GaN thin films
with dissimilar substrate materials by wafer bonding and laser lift-off”,
Compound Semiconductor, vol.5, no.9, p. 54-6, 1096-598X Franklin Publishing
Nov.-Dec. 1999 Wong, W.; Sands, T.; Cheung, N.; Kneissl, M.; Bour, D.; Mei, P.;
Romano, L.; Johnson, N.
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“Fabrication of thin-film InGaN light-emitting diode
membranes by laser lift-off”, Applied Physics Letters, vol.75, no.10, p.
1360-2, 1999. Wong, W.S.; Sands, T.; Cheung, N.W.; Kneissl, M.; Bour, D.P.; Mei,
P.; Romano, L.T.; Johnson, N.M.
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“Laser processing of polysilicon thin-film transistors:
grain growth and device fabrication” (Invited Paper), Phys. Status
Solidi A (Germany), Physica Status Solidi A, vol.166, no.2, p. 729-41, 1998.
Boyce, J.B.; Mei, P.; Fulks, R.T.; Ho, J.
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“Laser doping for self-aligned amorphous silicon thin film
transistors”, Proceedings of the Third Symposium on Thin Film Transistor
Technologies, p. 51-8, 1997. Mei, P.; Anderson, G.B.; Boyce, J.B.; Fork, D.K.;
Lujan, R.
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“Laser crystallized polysilicon thin films and
applications”, Polycrystalline Thin Films: Structure, Texture,
Properties, and Applications II. Symposium, p. 305-14, 1996. Boyce, J.B.; Mei,
P.; Fork, D.K.; Anderson, G.B.; Johnson, R.I.
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“A fully self-aligned thin-film transistor for display and
imaging applications”, 54th Annual Device Research Conference Digest
(Cat. No.96TH8193), p. 72-3 New York, NY, USA IEEE 1996. Mei, P.; Lujan, R.;
Boyce, J.B.; Fork, D.K.; Anderson, G.B.
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“Capillary waves in pulsed excimer laser crystallized
amorphous Silicon”, Applied Physics Letters, vol.68, no.15, p. 2138-40,
0003-6951 AIP 8 April 1996. Fork, D.K.; Anderson, G.B.; Boyce, J.B.; Johnson,
R.I.; Mei, P.
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“Poly-Si peripheral circuits and contact properties of
laser processed poly-Si thin film transistors”, 4th International
Conference on Solid-State and Integrated Circuit Technology. Proceedings (Cat.
No.95TH8143), p. 721-3, 1995. Mei, P.; Boyce, J.B.; Fork, D.K.; Hack, M.; Lujan,
R.; Ready, S.E.
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“Low temperature processes for p-type polycrystalline
silicon TFTs”, Proceedings of the Second Symposium on Thin Film
Transistor Technologies, p. 92-102, EDITOR: Kuo, Y. Pennington, NJ, USA
Electrochem. Soc 1995. Mei, P.; Anderson, G.B.; Boyce, J.B.; Fork, D.K.; Hack,
M.; Johnson, R.I.; Lujan, R.A.; Ready, S.E.; Wu, I.W.
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“Excimer laser annealing process for polysilicon TFT AMLCD
Applications”, Conference Record of the 1994 International Display
Research Conference and International Workshops on Active-Matrix LCDs and
Display Materials, p. 134-7, Santa Ana, CA, USA SID 1994 Yale Sun; Sheau Chen;
Ping Mei; Boyce, J.B.
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“Laser doping and crystallization of amorphous silicon
thin Films”, Microcrystalline and Nanocrystalline Semiconductors.
Symposium, p. 909-14, 1995. Boyce, J.B.; Anderson, G.B.; Carey, P.G.; Fork, D.K.;
Johnson, R.I.; Mei, P.; Ready, S.E.; Smith, P.M.
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“Considerations for large area fabrication of integrated
a-Si and poly-Si TFTs”, Flat Panel Display Materials. Symposium, p.
41-6, Pittsburgh, PA, USA Mater. Res. Soc 1994. Mei, P.; Anderson, G.B.; Boyce,
J.B.; Fork, D.K.; Hack, M.; Johnson, R.I.; Lujan, R.A.; Ready, S.E.
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“Characterization of the substrate interface of
crystallized polycrystalline silicon thin films”, Polycrystalline Thin
Films: Structure, Texture, Properties and Applications Symposium, p. 709-14,
Philadelphia, PA, USA Mater. Res. Soc 1994 Anderson, G.B.; Boyce, J.B.; Fork,
D.K.; Johnson, R.I.; Mei, P.; Ready, S.E.
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“Pulse-to-pulse laser stability effects on multiple shot
excimer laser crystallized a-Si thin films”, Polycrystalline Thin Films:
Structure, Texture, Properties and Applications Symposium, p. 703-8,
Philadelphia, PA, USA Mater. Res. Soc 1994. Johnson, R.I.; Anderson, G.B.;
Boyce, J.B.; Fork, D.K.; Mei, P.; Ready, S.E.
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“Large grain creation and destruction in excimer laser
crystallized amorphous silicon”, Crystallization and Related Phenomena
in Amorphous Materials. Symposium, p. 671-6, Pittsburgh, PA, USA Mater. Res. Soc
1994. Boyce, J.B.; Anderson, G.B.; Fork, D.K.; Johnson, R.I.; Mei, P.; Ready,
S.E.
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“On the nature of the defect passivation in
polycrystalline silicon by hydrogen and oxygen plasma treatments”, IEEE
Transactions on Electron Devices, vol.42, no.8, p.1559-60, 0018-9383 Aug. 1995.
Nickel, N.H.; Mei, P.; Boyce, J.B.
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“Grain growth in laser dehydrogenated and crystallized
polycrystalline silicon for thin film transistors”, Journal of Applied
Physics, vol.76, no.5, p. 3194-9, 0021-8979 1 Sept. 1994. Mei, P.; Boyce, J.B.;
Hack, M.; Lujan, R.; Ready, S.E.; Fork, D.K.; Johnson, R.I.; Anderson, G.B.
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“Laser dehydrogenation/crystallization of plasma-enhanced
chemical vapor deposited amorphous silicon for hybrid thin film transistors”,
Applied Physics Letters, vol.64, no.9, p. 1132-4, 0003-695128 Feb. 1994. Mei,
P.; Boyce, J.B.; Hack, M.; Lujan, R.A.; Johnson, R.I.; Anderson, G.B.; Fork, D.K.;
Ready, S.E.
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“Temperature dependence of the Hall mobility in
polycrystalline Silicon”, Amorphous Silicon Technology - 1993 Symposium,
p. 545-50, Pittsburgh, PA, USA Mater. Res. Soc 1993. Ready, S.E.; Boyce, J.B.;
Fork, D.K.; Mei, P.; Anderson, G.B.;Johnson, R.I.
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“Critical laser fluence observed in (111) texture, grain
size and mobility of laser crystallized amorphous silicon”, Amorphous
Silicon Technology - 1993 Symposium, p. 533-8, Pittsburgh, PA, USA Mater. Res.
Soc 1993. Johnson, R.I.; Anderson, G.B.; Boyce, J.B.; Fork, D.K.; Mei, P.;
Ready, S.E.; Chen, S.
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“Laser dehydrogenation of PECVD amorphous silicon”,
Amorphous Silicon Technology - 1993 Symposium, p. 151-6, Pittsburgh, PA, USA
Mater. Res. Soc 1993. Mei, P.; Boyce, J.B.; Hack, M.; Lujan, R.A.; Johnson,
R.I.; Anderson, G.B.; Fork, D.K.; Ready, S.E.; Smith, D.L.
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“Structural study of tin and carbon coimplanted silicon”,
Journal of Applied Physics, vol.69, no.12, p. 8417-19, 0021-8979, 15 June 1991.
Mei, P.; Schmidt, M.T.; Yang, E.S.; Wilkens, B.J.
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“Effects of Ge concentration on SiGe oxidation behavior”,
Applied Physics Letters, vol.59, no.10, p. 1200-2, 0003-6951, 2 Sept. 1991. Liou,
H.K.; Mei, P.; Gennser, U.; Yang, E.S.
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“Picosecond photoconductive response of polycrystalline
silicon thin films”, Applied Physics Letters, vol.57, no.1, p. 64-6,
0003-695, 2 July 1990. Shu, C.; Hu, B.B.; Zhang, X.-C.; Mei, P.; Yang, E.S.
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“Electrical and structural properties of shallow p+
junctions formed by dual (Ga/B) ion implantation”, Applied Physics
Letters, vol.56, no.14, p. 1362-4, 0003-6951, 2 April 1990. Mei, P.; Jalali, B.;
Yang, E.S.; Stoffel, N.G.; Hart, D.L.
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“Studies of In/sub 0.53/Ga/sub 0.47/As/InP superlattice
mixing and conversion”, Advances in Materials, Processing and Devices in
III-V Compound Semiconductors Symposium, p. 233-8, Pittsburgh, PA, USA Mater.
Res. Soc 1989 Schwarz, S.A.; Mei, P.; Hwang, D.M.; Schwartz, C.L.; Venkatesan,
T.; Palmstrom, C.J.; Stoffel, N.G.; Bhat, R.
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“Study of the carrier concentration effect on Si enhanced
AlGaAs/GaAs superlattice mixing”, Epitaxy of Semiconductor Layered
Structures: Symposium, p. 161-4, Pittsburgh, PA, USA Mater. Res. Soc 1988 Mei,
P.; Venkatesan, T.; Schwarz, S.A.; Stoffel, N.G.; Harbison, J.P.
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“Conversion of InP/In 0.53/Ga0.47/As superlattices to Zn
3P 2/In 1-xGaAs and Zn 3P 2/Zn3As 2 superlattices by Zn diffusion”,
Applied Physics Letters, vol.54, no.12, p. 1160-2, 0003-6951, 20 March 1989.
Hwang, D.; Schwarz, S.A.; Mei, P.; Bhat, R.; Venkatesan, T.; Nazar, L.;
Schwartz, C.L.
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“Te induced AlAs/GaAs superlattice mixing”,
Advanced Surface Processes for Optoelectronics: Symposium, p. 71-5, Pittsburgh,
PA, USA Mater. Res. Soc 1988. Mei, P.; Schwarz, S.A.; Venkatesan, T.; Schwartz,
C.L.; Colas,E.
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“Silicon induced mixing of AlGaAs superlattices-behavior
and mechanisms”, Advanced Surface Processes for Optoelectronics:
Symposium, p.43-54, Pittsburgh, PA, USA Mater. Res. Soc 1988 Schwarz, S.A.;
Venkatesan, T.; Mei, P.
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“Study of interdiffusion in a Te-doped AlAs-GaAs
superlattice”, Journal of Applied Physics, vol.65, no.5, p. 2165-7,
0021-8979, 1 March 1989. Mei, P.; Schwarz, S.A.; Venkatesan, T.; Schwartz, C.L.;
Colas, E.
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“Mixing inhibition and crystalline defects in heavily
Si-doped AlAs/GaAs superlattices”, Applied Physics Letters, vol.53,
no.26, p. 2650-2, 0003-6951, 26 Dec. 1988. Mei, P.; Schwarz, S.A.; Venkatesan,
T.; Schwartz, C.L.; Harbison, J.P.; Florez, L.; Theodore, N.D.; Carter, C.B.
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“Studies of ion beam enhanced mixing of AlGaAs
superlattices”, Proc. SPIE - Int. Soc. Opt. Eng. (USA), Proceedings of
the SPIE - The International Society for Optical Engineering, vol.945, p. 22-9,
0277-786X, 1988. Mei, P.; Schwarz, S.A.; Venkatesan, T.; Stoffel, N.G.; Harbison,
J.P.
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“InGaAs/InP superlattice mixing induced by Zn or Si
diffusion”, Applied Physics Letters, vol.53, no.12, p. 1051-3,
0003-6951, 19 Sept. 1988. Schwarz, S.A.; Mei, P.; Venkatesan, T.; Bhat, R.;
Hwang, D.M.; Schwartz, C.L.; Koza, M.; Nazar, L.; Skromme, B.J.
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“Comparative studies of ion-induced mixing of GaAs-AlAs
superlattices”, Applied Physics Letters, vol.52, no.18, p. 1487-9,
0003-6951, 2 May 1988. Mei, P.; Venkatesan, T.; Schwarz, S.A.; Stoffel, N.G.;
Harbison, J.P.; Hart, D.L.; Florez, L.A.
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“The effect of temperature and Si concentration on the
mixing of AlAs/GaAs superlattices”, Interfaces, Superlattices, and Thin
Films Symposium, p. 743-8, Pittsburgh, PA, USA Mater. Res. Soc 1987 Ping Mei;
Yoon, H.W.; Venkatesan, T.; Schwarz, S.A.; Harbison, J.P.
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“Ion induced mixing of AlGaAs/GaAs superlattices”,
Materials Modification and Growth Using Ion Beams. Symposium, p. 171-85,
Pittsburgh, PA, USA Mater. Res. Soc 1987 Venkatesan, T.; Schwarz, S.A.; Mei, P.;
Yoon, H.W.
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“Kinetics of silicon-induced mixing of AlAs-GaAs
superlattices”, Applied Physics Letters, vol.50, no.25, p. 1823-5,
0003-6951, 22 June 1987. Mei, P.; Yoon, H.W.; Venkatesan, T.; Schwarz, S.A.;
Harbison, J.P.
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“Depth-dependent mixing of an AlAs-GaAs superlattice by
ion Implantation”, Layered Structures and Epitaxy Symposium, p. 321-6,
Pittsburgh, PA, USA Mater. Res. Soc 1986. Schwarz, S.A.; Venkatesan, T.; Bhat,
R.; Koza, M.; Yoon, H.W.; Arakawa, Y.; Mei, P.
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“Dose-dependent mixing of AlAs-GaAs superlattices by Si
ion Implantation”, Applied Physics Letters, vol.49, no.12, p. 701-3,
0003-6951, 22 Sept. 1986. Venkatesan, T.; Schwarz, S.A.; Hwang, D.M.; Bhat, R.;
Koza, M.; Yoon, H.W.; Mei, P.; Arakawa, Y.; Yariv, A.
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